Russell Co., Ltd.

AMAT P5000 Multi-Process CVD

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Russell Co., Ltd.
[Korea]

Address
1-2, Doha-ri, Munbaek-myeon, Jincheon-gun, Chungcheongbuk-do
Phone
82-43-5328818
Contact name
Seokyoung-Ahn

Description

Feature

  • Id: RUS-E0004
  • Maker: AMAT
  • Model: AMAT P5000
  • Process: CVD
  • Wafer Size: 200mm

Product Introduction

  • Mark II P-5000 Mainframe
  • 3 Standard Single Frequency Chambers
  • Thru-the-wall Installation
  • 2 Monitors (Clean Room & Maintenance Monitor)
  • 3 P-TEOS Configuration, Version-IV Hot Box
  • 21 Slot VME
  • In/Output Wafer Sensor, WPS Sensor
  • Remote AC Rack
  • Minicontroller
  • 3 ENI (OEM-12B) RF Generators
  • 15 Slot Storage Elevator (Slot Spacing: 1802 Step)
  • AMAT 0 Heat-exchanger
  • Chamber Position A, B, C
  • Jungle Box: Standard P-TEOS Configuration (All Unit MFCs)
  • MFCs Subject to Confirmation
    - N2, 1000 sccm, UFC 1660
    - O2, 3000 sccm, UFC 1660
    - C2F6, 1000 sccm, UFC 1660
    - HE, 2000 sccm, UFC 1660
    - TEOS, 6000 sccm, UFM 8000 series(MFM)
  • Process Pumps: Not Include


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